Effect of vacuum-ultraviolet irradiation on the dielectric constant of low-k organosilicate dielectrics
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چکیده
Articles you may be interested in Effects of plasma and vacuum-ultraviolet exposure on the mechanical properties of low-k porous organosilicate glass J. Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation Appl. Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition Plasma damage effects on low-k porous organosilicate glass
منابع مشابه
Effects of vacuum ultraviolet irradiation on trapped charges and leakage currents of low-k organosilicate dielectrics
Articles you may be interested in Effect of vacuum-ultraviolet irradiation on the dielectric constant of low-k organosilicate dielectrics Appl. Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation Appl. The effects of plasma exposure and vacuum ultraviolet irradiation on photopatternable low-k dielectric materials Effect of vacuum ultraviolet and ...
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Capacitance-voltage C-V measurements are used to determine the effect of vacuum ultraviolet VUV and ultraviolet irradiation on mobile charges in porous low-k organosilicate SiCOH dielectrics. Hysteresis in the C-V characteristics shows that VUV irradiation increases the number of mobile charges in the dielectric. This is because VUV photons excite the trapped electrons from defect states to mak...
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